Home
→
Browsing by Subject

Browsing by Subject "Atomic layer deposition"

Now showing items 1-6 of 6

Advances in the surface passivation of silicon solar cells

Schmidt, Jan; Werner, Florian; Veith, Boris; Zielke, Dimitri; Steingrube, S.; Altermatt, Pietro P.; Gatz, Sebastian; Dullweber, Thorsten; Brendel, Rolf (Amsterdam : Elsevier BV, 2012)

The surface passivation properties of aluminium oxide (Al 2O 3) on crystalline Si are compared with the traditional passivation system of silicon nitride (SiN x). It is shown that Al 2O 3 has fundamental advantages over ...
Atomic-Layer-Deposited Al2O3 as Effective Barrier against the Diffusion of Hydrogen from SiNx:H Layers into Crystalline Silicon during Rapid Thermal Annealing

Helmich, Lailah; Walter, Dominic C.; Bredemeier, Dennis; Schmidt, Jan (Weinheim : Wiley-VCH, 2020)

Stacks of hydrogen-lean aluminum oxide, deposited via plasma-assisted atomic-layer-deposition, and hydrogen-rich plasma-enhanced chemical vapor-deposited silicon nitride (SiNx) are applied to boron-doped float-zone silicon ...
Effective passivation of crystalline silicon surfaces by ultrathin atomic-layer-deposited TiOx layers

Titova, V.; Veith-Wolf, B.; Startsev, D.; Schmidt, J. (London : Elsevier Ltd., 2017)

We characterize the surface passivation properties of ultrathin titanium oxide (TiOx) films deposited by atomic layer deposition (ALD) on crystalline silicon by means of carrier lifetime measurements. We compare different ...
High-rate atomic layer deposition of Al2O3 for the surface passivation of Si solar cells

Werner, Florian; Stals, Walter; Görtzen, Roger; Veith, Boris; Brendel, Rolf; Schmidt, Jan (Amsterdam : Elsevier BV, 2011)

High-rate spatial atomic layer deposition (ALD) enables an industrially relevant deposition of high-quality aluminum oxide (Al2O3) films for the surface passivation of silicon solar cells. We demonstrate a homogeneous ...
Implementation of full-area-deposited electron-selective TiOx layers into silicon solar cells

Titova, Valeriya; Schmidt, Jan (College Park, MD : American Institute of Physics, 2018)

We examine two different silicon solar cell designs featuring full-area electron-selective contacts based on ultrathin (2-3 nm) titanium oxide (TiOx) films deposited by atomic layer deposition. The first cell design applies ...
Magnetron sputter deposition of Ta2O5-SiO2 quantized nanolaminates

Schwyn Thöny, S.; Bärtschi, M.; Batzer, M.; Baselgia, M.; Waldner, S.; Steinecke, M.; Badorreck, H.; Wienke, A.; Jupé, M. (Washington, DC : Optica, 2023)

Quantized nanolaminates are a type of optical metamaterials, which were discovered only recently. Their feasibility was demonstrated by atomic layer deposition and ion beam sputtering so far. In this paper, we will report ...

Now showing items 1-6 of 6

Submit new document to repository

Browse

All content
- Communities & Collections
- By Issue Date
- Authors
- Titles
- Subjects
- Subjects (GND)
- DDC
- License
- Type

My Account

Usage Statistics

of the Repository

Browsing by Subject "Atomic layer deposition"

Browsing by Subject "Atomic layer deposition"

Browse

All content

My Account

Usage Statistics